Compact research platforms
Develop modular and practical systems that fit university laboratories, early-stage process development and research-scale production.
Our Aim
Build scientific equipment in India.
Our technical destination is clear: compact, modular semiconductor process systems designed around real research requirements and progressively engineered, integrated and manufactured in India.
The destination
From laboratory insight to dependable Indian hardware.
Our aim is to develop indigenous, compact tabletop instruments for semiconductor material growth and processing. We plan to begin with research-scale PVD, ALD and CVD platforms, progressively building the engineering, process, safety and manufacturing capabilities required to realise an indigenous MOCVD system for compound-semiconductor and oxide research.
Our long-term objective is technological self-reliance through scientific equipment developed and validated in India. Each platform will progress from a laboratory prototype to dependable, customer-ready equipment through clearly defined engineering milestones.
Our focus is not merely to assemble equipment. We first understand the material process, translate it into precise technical requirements, design the appropriate reactor and subsystem architecture, and validate performance, repeatability and safety before offering a system for customer use.
Design principles
Four priorities guide the programme.
These principles define how a research concept should progress towards a supportable system.
Process-led engineering
Define the reactor, gas delivery, heating, controls and safety architecture around the material process and customer utilities.
Indian design and integration
Increase the share of design, fabrication, assembly, control integration and validation completed through Indian technical capability.
Validated customer readiness
Move from laboratory concepts to documented systems through staged engineering, safety review, process trials and acceptance criteria.
Our current foundation
Two CVD platforms support the next stage of development.
LPCVD for β-Ga₂O₃ growth and Sn doping
For more than five years, our team has worked on the customisation and process development of an LPCVD platform for growing β-Ga₂O₃ and investigating controlled doping using Sn (tin).
The work has progressed through reactor modification, process optimisation, material growth, characterisation and device development. It has resulted in peer-reviewed publications and presentations at national and international conferences, lectures and technical forums, together with national-level gold-medal recognition at IIT Guwahati.
A separate Indian patent filing is in progress for this development, covering instrument design, thin-film deposition methods and associated process innovations.
Mist CVD for gallium oxide and related oxides
Our team has developed and used a mist-CVD platform for the growth of α-, κ- and other phases of gallium oxide, as well as copper oxide and aluminium gallium oxide materials.
The programme includes investigating lithium incorporation as a possible route towards p-type doping in gallium oxide. It covers thin-film growth, phase control, material characterisation, doping studies and semiconductor device design.
This work has produced multiple peer-reviewed publications and received the IEEE EDTM Best Student Paper Award, along with other national-level recognition. It has also been presented at recognised events including IEEE EDTM, IWPSD and ICEE.
A separate Indian patent filing is in progress for this development, covering instrument design, thin-film deposition methods and associated process innovations.
PLANNED PROGRESSION
From tabletop process systems to indigenous MOCVD
- Compact research-scale PVD, ALD and CVD platforms
- MOCVD for compound-semiconductor and oxide research
- Vertical showerhead architecture with controlled gas delivery
- Heated showerhead with an adjustable showerhead-to-wafer gap
- RF induction or a suitable alternative for susceptor heating
- Future 4-inch handling after engineering and process validation
Planned systems describe development targets. Commercial configuration, safety controls, substrate size and process performance will be confirmed only after application-specific engineering and validation.
How the aim becomes a system
A staged path from requirement to delivery.
Each stage has a defined technical purpose, helping reduce risk before the next engineering commitment.
Define
Process objective, substrate, chemistry, utilities and safety boundary
Design
Reactor geometry, gas delivery, heating, vacuum and controls
Build
Fabrication, integration, assembly and documentation
Validate
Leak, temperature, flow, safety and process checks
Deliver
Installation, training and application-specific acceptance
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